Atomic layer deposition (ALD) has received much interest since it was introduced with the name atomic layer epitaxy (ALE) in the late 1970s. ALD is based on sequential surface chemical reactions and ...
Dutch equipment supplier SALD has announced delivery of a spatial atomic layer deposition system to an unnamed customer in the United States. The tool will be used in the pilot-scale production of ...
SkyWater Technology has announced it will offer customers a new semiconductor processing tool for atomic layer deposition (ALD), the Applied Picosun Morpher. Many devices, such as sensors and emerging ...
Researchers from the Institute of Process Engineering (IPE) of the Chinese Academy of Sciences and Argonne National Laboratory (Argonne) in the U.S. have recently employed atomic layer deposition (ALD ...
The decomposition of methylene blue (C16H18N3S, MB) solution is used to study the photoactivity of TiO2 nanoparticles, with and without Pt-doping. Under UV light irradiation, the MB solution reacts ...
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