What’s in store for chipmakers at 7nm, 5nm and beyond, and why atomic-level etch and deposition are getting new attention. Prabu Raja, group vice president and general manager for the Patterning and ...

(Nanowerk News) Scientists have managed to draw at high resolution and speed, local patterns in organic semiconductor films used in optoelectronic and photonic applications. The new method enables the ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

Chip scaling is becoming more difficult at each process node, but the industry continues to find new and innovative ways to solve the problems at every turn. And so chipmakers continue to march down ...

A new study by Center for Advanced Bioenergy and Bioproducts Innovation (CABBI) researchers investigates how data from a machine learning-enabled high-throughput phenotyping method can (1) aid in ...