The use of design-based care areas on inspection tools [1, 2] to characterize defects has been well established in recent years. However, the implementation has generally been limited to specific ...
Advanced Defect Inspection Techniques For nFET And pFET Defectivity At 7nm Gate Poly Removal Process
During 7nm gate poly removal process, polysilicon is removed exposing both NFET and PFET fins in preparation for high-k gate oxide. If the polysilicon etch is too aggressive or the source and drain ...
HAWTHORNE, N.Y., July 17, 2020 /PRNewswire/ -- SEMICON West 2020 – Microtronic, maker of high-speed full-wafer macro defect inspection systems and software, has just announced an innovative new way to ...
A novel fabrication approach developed by collaborating scientists at some of the top universities in the UK now allows for the insertion and real-time monitoring of quantum defects in diamonds. This ...
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